AN INVESTIGATION ON SURFACE CONDITIONS FOR SI MOLECULAR-BEAM EPITAXIAL (MBE) GROWTH

被引：24

作者：

XIE, YH

WANG, KL

KAO, YC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.573116

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1035 / 1039

页数：5

共 10 条

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