TRACE SURFACE-ANALYSIS - 30 PPB ANALYSIS WITH REMOVAL OF LESS THAN A MONOLAYER - FE AND TI IMPURITIES IN THE FIRST ATOMIC LAYER OF SI WAFERS

被引：31

作者：

PELLIN, MJ ^{[1
]}

YOUNG, CE ^{[1
]}

CALAWAY, WF ^{[1
]}

GRUEN, DM ^{[1
]}

机构：

[1] ARGONNE NATL LAB,DIV CHEM,ARGONNE,IL 60439

来源：

关键词：

* Work supported by the US Department of Energy; Materials Sciences; under Contract W-31-109.Eng-38;

D O I：

10.1016/0168-583X(86)90585-9

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：653 / 657

页数：5

共 14 条

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