SIZE EFFECTS IN RESISTIVITY OF EPITAXIAL-FILMS OF SILVER

被引：9

作者：

BERMAN, A ^{[1
]}

JURETSCHKE, HJ ^{[1
]}

机构：

[1] POLYTECH INST NEW YORK,BROOKLYN,NY 11201

来源：

PHYSICAL REVIEW B | 1975年 / 11卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.11.2893

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2893 / 2902

页数：10

共 21 条

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