DEPTH DISTRIBUTIONS OF SILVER IONS IMPLANTED IN SI AND SIO2

被引:7
作者
BARCZ, A
TUROS, A
WIELUNSKI, L
ROSINSKI, W
WOJTOWICZNATANSON, B
机构
[1] INST NUCL RES,HOZA 69,00-681 WARSAW,POLAND
[2] INST ELECTR TECHNOL,AL LOTNIKOW 32,02-668 WARSAW,POLAND
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1975年 / 25卷 / 02期
关键词
D O I
10.1080/00337577508234733
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
引用
收藏
页码:91 / 96
页数:6
相关论文
共 9 条
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