ADHESIVE STRENGTH OF THE INTERFACE BETWEEN A METAL-FILM AND CRYSTALLINE QUARTZ

被引：4

作者：

VARCHENYA, SA

UPIT, GP

机构：

[1] Acad of Sciences of the latvian SSR,, Inst of Physics, Riga, USSR, Acad of Sciences of the latvian SSR, Inst of Physics, Riga, USSR

来源：

关键词：

INTERFACES;

D O I：

10.1016/0040-6090(84)90378-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：59 / 62

页数：4

共 8 条

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BENJAMIN, P ;

WEAVER, C .

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[2]

GUBANOV AI, 1977, FIZ TVERD TELA+, V19, P1369

[3]

KARNOWSKY M, 1964, REV SCI INSTRUM, P1324

[4] THIN-FILM METALLIZATION OF OXIDES IN MICROELECTRONICS [J].

MATTOX, DM .

[5]

ROJKH I, 1976, ELEKTRON OBRABOTKA M, P31

STRAUSSER, YE ;

SCHEIBNER, EJ ;

JOHANNESSEN, JS .

[7]

VARCHENYA S, 1976, FIZ TVERD TELA LENIN, V17, P3568

[8]

VARCHENYA S, 1981, STRENGTH ENERGETIC C