STUDY OF OXIDATION OF TANTALUM NITRIDE BY ELLIPSOMETRY AND AUGER-ELECTRON SPECTROSCOPY

被引:6
作者
ADAMS, JR [1 ]
KRAMER, DK [1 ]
机构
[1] SANDIA LABS,ALBUQUERQUE,NM 87115
关键词
D O I
10.1016/0039-6028(76)90469-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:482 / 487
页数:6
相关论文
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[6]   THERMAL OXIDATION OF SPUTTERED TANTALUM THIN FILMS BETWEEN 100 DEGREES C AND 525 DEGREES C [J].
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