THE GERMANIUM SELENIDE POLYMER BILEVEL PHOTORESIST SYSTEM - A REVIEW

被引：4

作者：

HUGGETT, PG ^{[1
]}

LEHMANN, HW ^{[1
]}

机构：

[1] LABS RCA LTD,CH-8048 ZURICH,SWITZERLAND

来源：

关键词：

D O I：

10.1007/BF02661219

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：205 / 230

页数：26

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