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HIGH-RESOLUTION ELECTRON-MICROSCOPY OF CAF2/SILICON INTERFACES
被引:27
作者
:
PONCE, FA
论文数:
0
引用数:
0
h-index:
0
机构:
GE,CTR RES & DEV,SCHENECTADY,NY 12301
GE,CTR RES & DEV,SCHENECTADY,NY 12301
PONCE, FA
[
1
]
ANDERSON, GB
论文数:
0
引用数:
0
h-index:
0
机构:
GE,CTR RES & DEV,SCHENECTADY,NY 12301
GE,CTR RES & DEV,SCHENECTADY,NY 12301
ANDERSON, GB
[
1
]
OKEEFE, MA
论文数:
0
引用数:
0
h-index:
0
机构:
GE,CTR RES & DEV,SCHENECTADY,NY 12301
GE,CTR RES & DEV,SCHENECTADY,NY 12301
OKEEFE, MA
[
1
]
SCHOWALTER, LJ
论文数:
0
引用数:
0
h-index:
0
机构:
GE,CTR RES & DEV,SCHENECTADY,NY 12301
GE,CTR RES & DEV,SCHENECTADY,NY 12301
SCHOWALTER, LJ
[
1
]
机构
:
[1]
GE,CTR RES & DEV,SCHENECTADY,NY 12301
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
|
1986年
/ 4卷
/ 04期
关键词
:
D O I
:
10.1116/1.583553
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:1121 / 1122
页数:2
相关论文
共 3 条
[1]
MBE-GROWN FLUORIDE FILMS - A NEW CLASS OF EPITAXIAL DIELECTRICS
FARROW, RFC
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FARROW, RFC
SULLIVAN, PW
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JONES, GR
CAMERON, DC
论文数:
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引用数:
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CAMERON, DC
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1981,
19
(03):
: 415
-
420
[2]
SURFACE-MORPHOLOGY OF EPITAXIAL CAF2 FILMS ON SI SUBSTRATES
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GE,CTR RES & DEV,SCHENECTADY,NY 12301
GE,CTR RES & DEV,SCHENECTADY,NY 12301
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SCHOWALTER, LJ
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引用数:
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h-index:
0
机构:
GE,CTR RES & DEV,SCHENECTADY,NY 12301
GE,CTR RES & DEV,SCHENECTADY,NY 12301
SCHOWALTER, LJ
[J].
APPLIED PHYSICS LETTERS,
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[3]
SILICON INSULATOR HETERO-EPITAXIAL STRUCTURES FORMED BY VACUUM DEPOSITION OF CAF2 AND SI
ISHIWARA, H
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ISHIWARA, H
ASANO, T
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[J].
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40
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68
←
1
→
共 3 条
[1]
MBE-GROWN FLUORIDE FILMS - A NEW CLASS OF EPITAXIAL DIELECTRICS
FARROW, RFC
论文数:
0
引用数:
0
h-index:
0
FARROW, RFC
SULLIVAN, PW
论文数:
0
引用数:
0
h-index:
0
SULLIVAN, PW
WILLIAMS, GM
论文数:
0
引用数:
0
h-index:
0
WILLIAMS, GM
JONES, GR
论文数:
0
引用数:
0
h-index:
0
JONES, GR
CAMERON, DC
论文数:
0
引用数:
0
h-index:
0
CAMERON, DC
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1981,
19
(03):
: 415
-
420
[2]
SURFACE-MORPHOLOGY OF EPITAXIAL CAF2 FILMS ON SI SUBSTRATES
FATHAUER, RW
论文数:
0
引用数:
0
h-index:
0
机构:
GE,CTR RES & DEV,SCHENECTADY,NY 12301
GE,CTR RES & DEV,SCHENECTADY,NY 12301
FATHAUER, RW
SCHOWALTER, LJ
论文数:
0
引用数:
0
h-index:
0
机构:
GE,CTR RES & DEV,SCHENECTADY,NY 12301
GE,CTR RES & DEV,SCHENECTADY,NY 12301
SCHOWALTER, LJ
[J].
APPLIED PHYSICS LETTERS,
1984,
45
(05)
: 519
-
521
[3]
SILICON INSULATOR HETERO-EPITAXIAL STRUCTURES FORMED BY VACUUM DEPOSITION OF CAF2 AND SI
ISHIWARA, H
论文数:
0
引用数:
0
h-index:
0
ISHIWARA, H
ASANO, T
论文数:
0
引用数:
0
h-index:
0
ASANO, T
[J].
APPLIED PHYSICS LETTERS,
1982,
40
(01)
: 66
-
68
←
1
→