PHOTOABLATION OF POLYMERS AT 193 NM - SHOT-TO-SHOT STUDY OF EMISSION-SPECTRA, ETCH DEPTHS, AND TRANSMISSION

被引：14

作者：

DESHMUKH, S ^{[1
]}

ROTHE, EW ^{[1
]}

RECK, GP ^{[1
]}

机构：

[1] WAYNE STATE UNIV,DEPT CHEM,DETROIT,MI 48202

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 03期

关键词：

D O I：

10.1063/1.344438

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1370 / 1374

页数：5

共 15 条

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[8] MICROSCOPIC MODEL FOR THE ABLATIVE PHOTODECOMPOSITION OF POLYMERS BY FAR-ULTRAVIOLET RADIATION (193 NM) [J].

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[9] EMISSION-SPECTRA AND ETCHING OF POLYMERS AND GRAPHITE IRRADIATED BY EXCIMER LASERS [J].

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