LASER ABLATION OF ORGANIC POLYMERS - MICROSCOPIC MODELS FOR PHOTOCHEMICAL AND THERMAL-PROCESSES

被引：196

作者：

GARRISON, BJ ^{[1
]}

SRINIVASAN, R ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 08期

关键词：

D O I：

10.1063/1.335230

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2909 / 2914

页数：6

共 22 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J].

ANDREW, JE ;

DYER, PE ;

FORSTER, D ;

KEY, PH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :717-719

[2] FREE-JET EXPANSIONS FROM LASER-VAPORIZED PLANAR SURFACES [J].

COVINGTON, MA ;

LIU, GN ;

LINCOLN, KA .

AIAA JOURNAL, 1977, 15 (08) :1174-1179

[3]

DAVIS GM, APPL PHYS

[4] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J].

DEUTSCH, TF ;

GEIS, MW .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) :7201-7204

[5] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J].

DYER, PE ;

SIDHU, J .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) :1420-1422

[6]

EYRING H, 1944, QUANTUM CHEM, P272

[7] ION-BEAM SPECTROSCOPY OF SOLIDS AND SURFACES [J].

GARRISON, BJ ;

WINOGRAD, N .

SCIENCE, 1982, 216 (4548) :805-812

[8] MICROSCOPIC MODEL FOR THE ABLATIVE PHOTODECOMPOSITION OF POLYMERS BY FAR-ULTRAVIOLET RADIATION (193 NM) [J].

GARRISON, BJ ;

SRINIVASAN, R .

APPLIED PHYSICS LETTERS, 1984, 44 (09) :849-851

[9] SELF-DEVELOPING RESIST WITH SUBMICROMETER RESOLUTION AND PROCESSING STABILITY [J].

GEIS, MW ;

RANDALL, JN ;

DEUTSCH, TF ;

DEGRAFF, PD ;

KROHN, KE ;

STERN, LA .

APPLIED PHYSICS LETTERS, 1983, 43 (01) :74-76

[10] LOW-ENERGY ION IMPACT PHENOMENA ON SINGLE-CRYSTAL SURFACES [J].

HARRISON, DE ;

KELLY, PW ;

GARRISON, BJ ;

WINOGRAD, N .

SURFACE SCIENCE, 1978, 76 (02) :311-322

← 1 2 3 →