VACUUM ANNEALING STUDIES OF THE STRUCTURE AND OF MECHANICAL-PROPERTIES OF THIN TITANIUM NITRIDE FILMS DEPOSITED BY ACTIVATED REACTIVE EVAPORATION

被引：19

作者：

WENDLER, B

机构：

来源：

THIN SOLID FILMS | 1986年 / 141卷 / 02期

关键词：

D O I：

10.1016/0040-6090(86)90350-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：223 / 228

页数：6

共 10 条

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[7] MECHANISMS OF REACTIVE SPUTTERING OF TITANIUM NITRIDE AND TITANIUM CARBIDE .1. INFLUENCE OF PROCESS PARAMETERS ON FILM COMPOSITION [J].

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[8]

WENDLER B, 1984, 11TH P INT C APPL CR, P580

[9]

WENDLER B, 1985, ACTA U WRATISLAV, V847, P163

[10]

WENDLER B, 1984, 11TH P C APPL CRYST, P585

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