GROWTH OF BORON WHISKERS AND RIBBONS IN A LOW-PRESSURE B2H6+HE+H-2 PLASMA

被引:11
作者
KOMATSU, S
MORIYOSHI, Y
机构
[1] National Institute for Research in Inorganic Materials, Tsukuba, Ibaraki, 305
关键词
D O I
10.1016/0022-0248(90)90858-I
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The relationship between the growth conditions and morphological and structural characteristics of boron whiskers grown in plasma enhanced chemical vapor deposition from B2H6 + He + H2 was investigated for the first time. The conditions were as follows: plasma power was 2 kW, pressure was 200 Pa, total gas flow rate was 100 SCCM, substrate temperature ranged from 700 to 880°C, diborance concentration ranged from 0.25 to 1.5 vol%, and hydrogen concentration ranged from 5 to 30 vol%. The whisker growth was preferred with the increased Ts, which accompanied preferred orientation of 〈110〉 to the surface in a hexagonal assignment. The effect of hydrogen or diborane concentration on the whisker growth was prominent, but all whisker samples showed the 〈100〉 preferred orientation. © 1990.
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页码:899 / 907
页数:9
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