CHARGE STORAGE MISFET MEMORY DEVICES

被引:3
作者
KIM, MJ [1 ]
机构
[1] GE,SYRACUSE,NY 13201
关键词
D O I
10.1143/JJAP.13.1847
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1847 / 1858
页数:12
相关论文
共 24 条
[1]  
ARCHER RC, 1962, J OPT SOC AM, V52, P920
[2]   A NEW MNOS CHARGE STORAGE EFFECT [J].
DILL, HG ;
TOOMBS, TN .
SOLID-STATE ELECTRONICS, 1969, 12 (12) :981-&
[3]  
FRANKEL J, 1938, SOVIET PHYS TECH PHY, V5, P685
[4]   MEMORY BEHAVIOR IN A FLOATING-GATE AVALANCHE-INJECTION MOS (FAMOS) STRUCTURE [J].
FROHMANB.D .
APPLIED PHYSICS LETTERS, 1971, 18 (08) :332-&
[5]   METAL-NITRIDE-OXIDE-SILICON(MNOS) TRANSISTOR - CHARACTERISTICS AND APPLICATIONS [J].
FROHMANB.D .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1970, 58 (08) :1207-+
[6]  
FROHMANBENTCHKO.D, 1971, ISSCC, P80
[7]  
FROHMANBENTCHKO.D, 1969, J APPL PHYS, V40, P1307
[8]  
Good RH., 1956, FIELD EMISSION, P176
[9]   MOS-FET FABRICATION PROBLEMS [J].
KIM, MJ .
SOLID-STATE ELECTRONICS, 1969, 12 (07) :557-+
[10]   FOWLER-NORDHEIM TUNNELING INTO THERMALLY GROWN SIO2 [J].
LENZLINGER, M ;
SNOW, EH .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) :278-+