THE DEPOSITION CHARACTERISTICS AND THE STRUCTURAL NATURE OF THE DEPOSIT IN THE CHEMICAL VAPOR-DEPOSITION OF BORON

被引：8

作者：

PARK, CS ^{[1
]}

YOO, JS ^{[1
]}

CHUN, JS ^{[1
]}

机构：

[1] KOREA ADV INST SCI & TECHNOL,DEPT MAT SCI & ENGN,SEOUL 131,SOUTH KOREA

来源：

关键词：

D O I：

10.1016/0040-6090(85)90141-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：205 / 214

页数：10

共 18 条

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CARLSSON, JO
[J]. JOURNAL OF THE LESS-COMMON METALS, 1980, 71 (01): : 1 - 14
[4] JONES NE, 1975, TREATISE SOLID STATE, V5, P283
[5] Krukonis V., 1977, Boron and refractory borides, P517
[6] EFFECTS OF THE EXPERIMENTAL PARAMETERS ON THE PREFERRED ORIENTATION OF CHEMICALLY VAPOR-DEPOSITED TIC ON CEMENTED CARBIDES
LEE, CW
NAM, SW
CHUN, JS
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (01): : 42 - 46
[7] Mahagin D. E., 1977, Boron and refractory borides, P613
[8] MATTOX DM, 1979, SAND790707C SAND NAT
[9] Moorjani K., 1977, Boron and refractory borides, P581
[10] Naslain R., 1977, Boron and refractory borides, P139