TIB2 AND ZRB2 DIFFUSION-BARRIERS IN GAAS OHMIC CONTACT TECHNOLOGY

被引:55
作者
SHAPPIRIO, J [1 ]
FINNEGAN, J [1 ]
LUX, R [1 ]
FOX, D [1 ]
KWIATKOWSKI, J [1 ]
KATTELUS, H [1 ]
NICOLET, M [1 ]
机构
[1] CALTECH,PASADENA,CA 91125
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期
关键词
D O I
10.1116/1.572902
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2255 / 2258
页数:4
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