AN EFFICIENT INTEGRATION TECHNIQUE FOR USE IN THE MULTILAYER ANALYSIS OF SPREADING RESISTANCE PROFILES

被引：50

作者：

BERKOWITZ, HL

LUX, RA

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 05期

关键词：

D O I：

10.1149/1.2127565

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1137 / 1141

页数：5

共 11 条

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[7] MULTILAYER CORRECTION SCHEME FOR SPREADING RESISTANCE MEASUREMENTS [J].

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TAN, LS .

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[8] HIGH-SPEED IMPLEMENTATION AND EXPERIMENTAL EVALUATION OF MULTILAYER SPREADING RESISTANCE ANALYSIS [J].

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RUNG, RD ;

GAT, A ;

DUTTON, RW .

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[9] IMPURITY PROFILE MEASUREMENTS OF THIN EPITAXIAL SILICON WAFER BY MULTILAYER SPREADING RESISTANCE ANALYSIS [J].

LIDA, Y ;

ABE, H ;

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[10] SPREADING RESISTANCE CORRECTION FACTORS [J].

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