DEPOSITION OF MICROMETER-SIZED TUNGSTEN PATTERNS BY LASER TRANSFER TECHNIQUE

被引：47

作者：

KANTOR, Z ^{[1
]}

TOTH, Z ^{[1
]}

SZORENYI, T ^{[1
]}

TOTH, AL ^{[1
]}

机构：

[1] INST TECH PHYS,H-1325 BUDAPEST,HUNGARY

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 25期

关键词：

D O I：

10.1063/1.111255

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A simple single-step technique for surface patterning is presented. It is shown that well-adhering micrometer-sized patterns of 100% coverage preserving the shape and dimensions of the ablated area can be deposited by ablating and transferring tungsten thin films in the form of single solid pieces using single pulses of peak power up to 100 mW and 100 mus-1 ms duration from a diode-pumped YAG laser.

引用

收藏

页码：3506 / 3508

页数：3

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