NANOINDENTATION OF AG NI MULTILAYERED THIN-FILMS

被引：73

作者：

RUUD, JA

JERVIS, TR

SPAEPEN, F

机构：

[1] HARVARD UNIV,DIV APPL SCI,CAMBRIDGE,MA 02138

[2] LOS ALAMOS NATL LAB,LOS ALAMOS,NM 87545

来源：

JOURNAL OF APPLIED PHYSICS | 1994年 / 75卷 / 10期

关键词：

D O I：

10.1063/1.355787

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Nanoindentation was used to study the mechanical properties of Ag/Ni multilayered thin films. Both the hardness and the elastic modulus of the multilayered thin films had values between those for homogeneous Ag and Ni thin films. The trend in the hardness with layer repeat length can be explained by the effects of both the stress and the microstructure. No evidence for interfacial effects on hardness was found. A decrease in modulus at the smallest repeat lengths was compared with literature data on the elastic constants of Ag/Ni multilayers.

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页码：4969 / 4974

页数：6

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