OXYGEN-ADSORPTION ON SI(111) IN DIFFERENT MODIFICATIONS - 7X7, 1X1-NI, AND SPUTTERED

被引：26

作者：

MORGEN, P ^{[1
]}

WURTH, W ^{[1
]}

UMBACH, E ^{[1
]}

机构：

[1] TECH UNIV MUNICH,DEPT PHYS E20,D-8046 GARCHING,FED REP GER

来源：

SURFACE SCIENCE | 1985年 / 152卷 / APR期

关键词：

D O I：

10.1016/0039-6028(85)90524-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：1086 / 1095

页数：10

共 23 条

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[7] ELECTRON-SPECTROSCOPIC STUDIES OF THE EARLY STAGES OF THE OXIDATION OF SI
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[10] X-RAY PHOTOELECTRON-SPECTROSCOPY OF THERMALLY GROWN SILICON DIOXIDE FILMS ON SILICON
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