ELECTRICALLY CONDUCTING 2-LAYER RESIST SYSTEM USING AMORPHOUS-CARBON FILMS

[1] AMORPHOUS-CARBON FILMS AS RESIST MASKS WITH HIGH REACTIVE ION ETCHING RESISTANCE FOR NANOMETER LITHOGRAPHY [J]. APPLIED PHYSICS LETTERS, 1986, 48 (13) : 835 - 837

[2] LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04): : L210 - L212

[3] MORITA M, 1985, J ELECTROCHEM SOC, V131, P2402

[1] AMORPHOUS-CARBON FILMS AS RESIST MASKS WITH HIGH REACTIVE ION ETCHING RESISTANCE FOR NANOMETER LITHOGRAPHY [J]. APPLIED PHYSICS LETTERS, 1986, 48 (13) : 835 - 837

[2] LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04): : L210 - L212

[3] MORITA M, 1985, J ELECTROCHEM SOC, V131, P2402