QUANTITATIVE PHOTOELASTIC MEASUREMENT OF RESIDUAL STRAINS IN UNDOPED SEMI-INSULATING GALLIUM-ARSENIDE

被引:35
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YAMADA, M
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10.1063/1.96166
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O59 [应用物理学];
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页码:365 / 367
页数:3
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[1]  
Born M, 1970, PRINCIPLES OPTICS, P665
[2]   INTRINSIC PIEZOBIREFRINGENCE OF GE, SI, AND GAAS [J].
HIGGINBOTHAM, CW ;
CARDONA, M ;
POLLAK, FH .
PHYSICAL REVIEW, 1969, 184 (03) :821-+
[3]   A THERMOELASTIC ANALYSIS OF DISLOCATION GENERATION IN PULLED GAAS CRYSTALS [J].
JORDAN, AS ;
CARUSO, R ;
VONNEIDA, AR .
BELL SYSTEM TECHNICAL JOURNAL, 1980, 59 (04) :593-637
[4]   DIRECT OBSERVATION OF DISLOCATION EFFECTS ON THRESHOLD VOLTAGE OF A GAAS FIELD-EFFECT TRANSISTOR [J].
MIYAZAWA, S ;
ISHII, Y ;
ISHIDA, S ;
NANISHI, Y .
APPLIED PHYSICS LETTERS, 1983, 43 (09) :853-855
[5]  
NYE JF, 1972, PHYSICAL PROPERTIES, P235
[6]  
THEOCARIS PS, 1979, MATRIX THEORY PHOTOE, P105
[7]   SUBSTRATE EFFECTS ON THE THRESHOLD VOLTAGE OF GAAS FIELD-EFFECT TRANSISTORS [J].
WINSTON, HV ;
HUNTER, AT ;
OLSEN, HM ;
BRYAN, RP ;
LEE, RE .
APPLIED PHYSICS LETTERS, 1984, 45 (04) :447-449