共 8 条
[2]
Clarke M., 1975, Properties of Electrodeposits, P122
[4]
MODIFICATION OF EVAPORATED CHROMIUM BY CONCURRENT ION-BOMBARDMENT
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1980, 17 (01)
:425-428
[5]
TECHNOLOGY OF ION-BEAM SOURCES USED IN SPUTTERING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1978, 15 (02)
:272-276
[6]
MATTOX DM, 1982, DEPOSITION TECHNOLOG, P254