ALIGNMENT OF THIN-FILMS BY GLANCING ANGLE ION-BOMBARDMENT DURING DEPOSITION

被引：102

作者：

YU, LS

HARPER, JME

CUOMO, JJ

SMITH, DA

机构：

来源：

关键词：

D O I：

10.1063/1.95931

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：932 / 933

页数：2

共 7 条

[1]

Cuomo J. J., 1982, IBM Technical Disclosure Bulletin, V25, P3331

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[3]

HARPER JME, 1984, ION BOMBARDMENT MODI, P127

[4]

IVERSON RB, 1984, MATER RES SOC S P, V27, P543

[5] SPUTTERING OF SINGLE-CRYSTAL COPPER [J].

SNOUSE, TW ;

HAUGHNEY, LC .

[6] ETCHING OF DIAMOND WITH ARGON AND OXYGEN ION-BEAMS [J].

WHETTEN, TJ ;

ARMSTEAD, AA ;

GRZYBOWSKI, TA ;

RUOFF, AL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :477-480

[7]

YU LS, 1985, THESIS MIT CAMBRIDGE