ETCHING OF DIAMOND WITH ARGON AND OXYGEN ION-BEAMS

被引：78

作者：

WHETTEN, TJ

ARMSTEAD, AA

GRZYBOWSKI, TA

RUOFF, AL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 02期

关键词：

D O I：

10.1116/1.572598

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：477 / 480

页数：4

相关论文

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