EXAMINATION OF FLUOROCARBON-BASED PLASMAS USED IN THE SELECTIVE AND UNIFORM ETCHING OF SILICON DIOXIDE BY RESPONSE-SURFACE METHODOLOGY - EFFECTS OF HELIUM ADDITION

被引：14

作者：

RILEY, PE ^{[1
]}

KULKARNI, VD ^{[1
]}

BISHOP, SH ^{[1
]}

机构：

[1] NATL SEMICOND CORP,SANTA CLARA,CA 95051

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 01期

关键词：

D O I：

10.1116/1.584441

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：24 / 34

页数：11

共 31 条

[1] FUNDAMENTALS OF PLASMA CHEMISTRY [J].

BELL, AT .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :418-419

[2] OPTIMIZATION OF PLASMA PROCESSING FOR SILICON-GATE FET MANUFACTURING APPLICATIONS [J].

BERGENDAHL, AS ;

BERGERON, SF ;

HARMON, DL .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1982, 26 (05) :580-589

[3]

BOX GEP, 1978, STATISTICS EXPT

[4]

Chapman B., 1980, GLOW DISCHARGE PROCE

[5]

Coburn J.W., 1982, PLASMA CHEM PLASMA P, V2, P1, DOI 10.1007/BF00566856

[6] PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J].

COBURN, JW ;

WINTERS, HF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :391-403

[7] HOLLOW-CATHODE HELIUM-FLUORINE LASER [J].

CRANE, JK ;

VERDEYEN, JT .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) :123-129

[8] PLASMA POLYMERIZATION OF ETHYLENE AND THE SERIES OF FLUOROETHYLENES - PLASMA EFFLUENT MASS-SPECTROMETRY AND ESCA STUDIES [J].

DILKS, A ;

KAY, E .

MACROMOLECULES, 1981, 14 (03) :855-862

[9]

Dowdy S, 1983, STAT RES

[10] THE REACTION OF FLUORINE-ATOMS WITH SILICON [J].

FLAMM, DL ;

DONNELLY, VM ;

MUCHA, JA .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) :3633-3639

← 1 2 3 4 →