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VOLTAGE DEPENDENCE OF THE MOSFET GATE-TO-SOURCE DRAIN OVERLAP
被引:5
作者
:
OH, CS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,POB 218,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,POB 218,YORKTOWN HTS,NY 10598
OH, CS
[
1
]
CHANG, WH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,POB 218,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,POB 218,YORKTOWN HTS,NY 10598
CHANG, WH
[
1
]
DAVARI, B
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,POB 218,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,POB 218,YORKTOWN HTS,NY 10598
DAVARI, B
[
1
]
TAUR, Y
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,POB 218,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,POB 218,YORKTOWN HTS,NY 10598
TAUR, Y
[
1
]
机构
:
[1]
IBM CORP,THOMAS J WATSON RES CTR,POB 218,YORKTOWN HTS,NY 10598
来源
:
SOLID-STATE ELECTRONICS
|
1990年
/ 33卷
/ 12期
关键词
:
D O I
:
10.1016/0038-1101(90)90148-8
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
[No abstract available]
引用
收藏
页码:1650 / 1652
页数:3
相关论文
共 7 条
[1]
FINITE-ELEMENT ANALYSIS OF SEMICONDUCTOR-DEVICES - THE FIELDAY PROGRAM
[J].
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IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
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(04)
:218
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[2]
A CAPACITANCE METHOD TO DETERMINE THE GATE-TO-DRAIN SOURCE OVERLAP LENGTH OF MOSFETS
[J].
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KO, PK
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KO, PK
;
HU, CM
论文数:
0
引用数:
0
h-index:
0
HU, CM
.
IEEE ELECTRON DEVICE LETTERS,
1987,
8
(06)
:269
-271
[3]
EFFECTS OF THE GATE-TO-DRAIN SOURCE OVERLAP ON MOSFET CHARACTERISTICS
[J].
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IEEE ELECTRON DEVICE LETTERS,
1987,
8
(07)
:326
-328
[4]
STRUCTURE-ENHANCED MOSFET DEGRADATION DUE TO HOT-ELECTRON INJECTION
[J].
HSU, FC
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GRINOLDS, HR
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IEEE ELECTRON DEVICE LETTERS,
1984,
5
(03)
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[5]
SUBMICROMETER DEVICE DESIGN FOR HOT-ELECTRON RELIABILITY AND PERFORMANCE
[J].
HUI, J
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0
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0
h-index:
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HUI, J
;
MOLL, J
论文数:
0
引用数:
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MOLL, J
.
IEEE ELECTRON DEVICE LETTERS,
1985,
6
(07)
:350
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[6]
Ko P. K., 1986, International Electron Devices Meeting 1986. Technical Digest (Cat. No.86CH2381-2), P292
[7]
A SIMPLE-MODEL FOR THE OVERLAP CAPACITANCE OF A VLSI MOS DEVICE
[J].
SHRIVASTAVA, R
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.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
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(12)
:1870
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←
1
→
共 7 条
[1]
FINITE-ELEMENT ANALYSIS OF SEMICONDUCTOR-DEVICES - THE FIELDAY PROGRAM
[J].
BUTURLA, EM
论文数:
0
引用数:
0
h-index:
0
BUTURLA, EM
;
COTTRELL, PE
论文数:
0
引用数:
0
h-index:
0
COTTRELL, PE
;
GROSSMAN, BM
论文数:
0
引用数:
0
h-index:
0
GROSSMAN, BM
;
SALSBURG, KA
论文数:
0
引用数:
0
h-index:
0
SALSBURG, KA
.
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1981,
25
(04)
:218
-231
[2]
A CAPACITANCE METHOD TO DETERMINE THE GATE-TO-DRAIN SOURCE OVERLAP LENGTH OF MOSFETS
[J].
CHAN, TY
论文数:
0
引用数:
0
h-index:
0
CHAN, TY
;
WU, AT
论文数:
0
引用数:
0
h-index:
0
WU, AT
;
KO, PK
论文数:
0
引用数:
0
h-index:
0
KO, PK
;
HU, CM
论文数:
0
引用数:
0
h-index:
0
HU, CM
.
IEEE ELECTRON DEVICE LETTERS,
1987,
8
(06)
:269
-271
[3]
EFFECTS OF THE GATE-TO-DRAIN SOURCE OVERLAP ON MOSFET CHARACTERISTICS
[J].
CHAN, TY
论文数:
0
引用数:
0
h-index:
0
CHAN, TY
;
WU, AT
论文数:
0
引用数:
0
h-index:
0
WU, AT
;
KO, PK
论文数:
0
引用数:
0
h-index:
0
KO, PK
;
HU, CM
论文数:
0
引用数:
0
h-index:
0
HU, CM
.
IEEE ELECTRON DEVICE LETTERS,
1987,
8
(07)
:326
-328
[4]
STRUCTURE-ENHANCED MOSFET DEGRADATION DUE TO HOT-ELECTRON INJECTION
[J].
HSU, FC
论文数:
0
引用数:
0
h-index:
0
HSU, FC
;
GRINOLDS, HR
论文数:
0
引用数:
0
h-index:
0
GRINOLDS, HR
.
IEEE ELECTRON DEVICE LETTERS,
1984,
5
(03)
:71
-74
[5]
SUBMICROMETER DEVICE DESIGN FOR HOT-ELECTRON RELIABILITY AND PERFORMANCE
[J].
HUI, J
论文数:
0
引用数:
0
h-index:
0
HUI, J
;
MOLL, J
论文数:
0
引用数:
0
h-index:
0
MOLL, J
.
IEEE ELECTRON DEVICE LETTERS,
1985,
6
(07)
:350
-352
[6]
Ko P. K., 1986, International Electron Devices Meeting 1986. Technical Digest (Cat. No.86CH2381-2), P292
[7]
A SIMPLE-MODEL FOR THE OVERLAP CAPACITANCE OF A VLSI MOS DEVICE
[J].
SHRIVASTAVA, R
论文数:
0
引用数:
0
h-index:
0
SHRIVASTAVA, R
;
FITZPATRICK, K
论文数:
0
引用数:
0
h-index:
0
FITZPATRICK, K
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1982,
29
(12)
:1870
-1875
←
1
→