EFFECT OF SCALING OF INTERCONNECTIONS ON THE TIME-DELAY OF VLSI CIRCUITS

被引：153

作者：

SARASWAT, KC ^{[1
]}

MOHAMMADI, F ^{[1
]}

机构：

[1] NATL SEMICOND CORP,SANTA CLARA,CA 95051

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1982年 / 29卷 / 04期

关键词：

D O I：

10.1109/T-ED.1982.20757

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：645 / 650

页数：6

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