UV-EXCIMER-LASER ABLATION OF POLYMETHYLMETHACRYLATE AT 248 NM - CHARACTERIZATION OF INCUBATION SITES WITH FOURIER-TRANSFORM IR-SPECTROSCOPY AND UV-SPECTROSCOPY

被引：136

作者：

KUPER, S

STUKE, M

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1989年 / 49卷 / 02期

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D O I：

10.1007/BF00616301

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：211 / 215

页数：5

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共 23 条

[1] DISTORTIONS OF BAND SHAPES IN EXTERNAL REFLECTION INFRARED-SPECTRA OF THIN POLYMER-FILMS ON METAL SUBSTRATES
ALLARA, DL
BACA, A
PRYDE, CA
[J]. MACROMOLECULES, 1978, 11 (06) : 1215 - 1220
[2] CALVERT JG, 1966, PHOTOCHEMISTRY, P435
[3] LASER-PHOTOETCHING CHARACTERISTICS OF POLYMERS WITH DOPANTS
CHUANG, TJ
HIRAOKA, H
MODL, A
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (04): : 277 - 288
[4] MASS SPECTROSCOPIC IDENTIFICATION OF WAVELENGTH DEPENDENT UV LASER PHOTOABLATION FRAGMENTS FROM POLYMETHYLMETHACRYLATE
ESTLER, RC
NOGAR, NS
[J]. APPLIED PHYSICS LETTERS, 1986, 49 (18) : 1175 - 1177
[5] PHOTOLYTIC DEGRADATION OF POLY(METHYL METHACRYLATE)
FOX, RB
ISAACS, LG
STOKES, S
[J]. JOURNAL OF POLYMER SCIENCE PART A-GENERAL PAPERS, 1963, 1 (03): : 1079 - &
[6] CHARACTERIZATION OF A DISSOCIATIVE EXCITED-STATE IN THE SOLID-STATE - PHOTOCHEMISTRY OF POLY(METHYL METHACRYLATE) - PHOTOCHEMICAL PROCESSES IN POLYMERIC SYSTEMS .5.
GUPTA, A
LIANG, R
TSAY, FD
MOACANIN, J
[J]. MACROMOLECULES, 1980, 13 (06) : 1696 - 1700
[7] DEEP UV SUB-MICRON LITHOGRAPHY BY USING A PULSED HIGH-POWER EXCIMER LASER
KAWAMURA, Y
TOYODA, K
NAMBA, S
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) : 6489 - 6490
[8] EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER
KAWAMURA, Y
TOYODA, K
NAMBA, S
[J]. APPLIED PHYSICS LETTERS, 1982, 40 (05) : 374 - 375
[9] KOBSA H, COMMUNICATION
[10] TEMPORAL MEASUREMENTS OF PHOTOFRAGMENT ATTENUATION AT 248 NM IN THE LASER ABLATION OF POLYIMIDE IN AIR
KOREN, G
[J]. APPLIED PHYSICS LETTERS, 1987, 50 (16) : 1030 - 1032