DEPTH PROFILING OF AN ION PLATED INTERFACE BY ION SCATTERING SPECTROMETRY

被引：14

作者：

HOFFMAN, DW ^{[1
]}

NIMMAGADDA, R ^{[1
]}

机构：

[1] FORD MOTOR CO, SCI RES STAFF, DEARBORN, MI 48121 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 04期

关键词：

D O I：

10.1116/1.1312730

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：657 / 662

页数：6

共 11 条

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[3]

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[4]

KENNEDY KD, 1971, RES DEV, V22, P40

[5]

LEDER LB, 1973, P SOC VAC COATERS, V16, P110

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MATTOX, DM ;

BLAND, RD .

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[7] FUNDAMENTALS OF ION PLATING [J].

MATTOX, DM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :47-52

[8]

MATTOX DM, 1972, P C SPUTTERING ION P, P11

[9] INTERDIFFUSION IN THIN CONDUCTOR FILMS - CHROMIUM/GOLD, NICKEL/GOLD AND CHROMIUM SILICIDE/GOLD [J].

RAIRDEN, JR ;

NEUGEBAU.CA ;

SIGSBEE, RA .

METALLURGICAL TRANSACTIONS, 1971, 2 (03) :719-+

[10] ADHERENCE AND POROSITY IN ION PLATED GOLD [J].

SCHROEDER, CF ;

MCDONALD, JE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (09) :889-+

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