PIEZO LOCKING STAGE FOR NANOMETER ELECTRON-BEAM LITHOGRAPHY

被引：2

作者：

KRATSCHMER, E

RISHTON, SA

LUHN, HE

KERN, DP

CHANG, THP

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584548

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1418 / 1421

页数：4

共 5 条

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[2] COANE PJ, 1982, P MICROCIRCUIT ENG, P373
[3] QUANTITATIVE-ANALYSIS OF RESOLUTION AND STABILITY IN NANOMETER ELECTRON-BEAM LITHOGRAPHY
KRATSCHMER, E
RISHTON, SA
KERN, DP
CHANG, THP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2074 - 2079
[4] DEVELOPMENT OF NANOMETRIC ELECTRON-BEAM LITHOGRAPHY SYSTEM (JBX-5D-II)
SHEARER, MH
TAKEMURA, H
ISOBE, M
GOTO, N
TANAKA, K
MIYAUCHI, S
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 64 - 67
[5] BARRY C4177 B