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DOSE AND DOSE-RATE EFFECTS ON THE STRUCTURE OF METHANE PLASMA SOURCE ION-IMPLANTED 304 STAINLESS-STEEL

被引：12
作者：
CHEN, J
CONRAD, JR
DODD, RA
机构：
[1] Engineering Research Center for Plasma-aided Manufacturing, Madison, WI 53706
来源：
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1993年 / 161卷 / 01期
关键词：
D O I：
10.1016/0921-5093(93)90480-3
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Type 304 stainless steel was treated by methane plasma source ion implantation. The effects of implantation dose and dose rate on the microstructure have been investigated. The implantation was carried out at a target bias of -30 keV, Two different doses: 1.5 x 10(17) and 3 x 10(17) atoms cm-2, and three dose rates: 3.4, 6.8 and 15 muA cm-2 were used. Higher doses and lower dose rates favor the formation of crystalline structure in the form of Fe2C (at 3.4 muA cm-2), or a mixture of Fe2C and possibly Fe3C and/or (Fe, Cr)7C3 (at 6.8 muA cm-2). Higher dose rates and lower doses favor the development of an amorphous structure. The mechanism of phase transformation in the implanted layer and its dependence on dose and dose rate are discussed.
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页码：97 / 103
页数：7
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