INTERFACE STRUCTURE AND LATTICE MISMATCH OF EPITAXIAL COSI2 ON SI(111)

被引：39

作者：

ZEGENHAGEN, J

HUANG, KG

HUNT, BD

SCHOWALTER, LJ

机构：

[1] SUNY ALBANY,ALBANY,NY 12222

[2] GE,CTR RES & DEV,SCHENECTADY,NY 12301

[3] RENSSELAER POLYTECH INST,TROY,NY 12180

来源：

APPLIED PHYSICS LETTERS | 1987年 / 51卷 / 15期

关键词：

D O I：

10.1063/1.98724

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1176 / 1178

页数：3

共 19 条

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[2]

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[3] ATOMIC-STRUCTURE OF THE NISI2/(111)SI INTERFACE [J].

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[4]

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[5]

GIBSON JM, 1982, APPL PHYS LETT, V41, P818, DOI 10.1063/1.93699

[6]

GIBSON JM, 1984, MATER RES SOC S P, V25, P405

[7] OBSERVATION OF INTERNAL X-RAY WAVE FIELDS DURING BRAGG-DIFFRACTION WITH AN APPLICATION TO IMPURITY LATTICE LOCATION [J].

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BATTERMAN, BW ;

BROWN, WL .

PHYSICAL REVIEW B, 1974, 10 (10) :4239-4243

[8] X-RAY STANDING WAVE ANALYSIS OF BISMUTH IMPLANTED IN SI(110) [J].

HERTEL, N ;

MATERLIK, G ;

ZEGENHAGEN, J .

ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER, 1985, 58 (03) :199-204

[9]

HUNT BD, 1986, MATER RES SOC S P, V56, P151

[10]

HUNT DB, 1987, J VAC SCI TECHNOL B, V5, P749

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