ALKENYLSILANE SULFONE COPOLYMERS AND TERPOLYMERS AS ELECTRON-BEAM-SENSITIVE POSITIVE RESISTS FOR 2-LAYER SYSTEMS

被引：9

作者：

GOZDZ, AS

CRAIGHEAD, HG

BOWDEN, MJ

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 11期

关键词：

D O I：

10.1149/1.2113673

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2809 / 2810

页数：2

共 9 条

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[3]

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[6]

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[8]

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[9] ADDITION OF TRICHLOROMETHYL RADICALS TO ALKENYLSILANES [J].

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