STRUCTURAL AND OPTICAL-PROPERTIES OF RF-SPUTTERED CDS THIN-FILMS

被引：38

作者：

DELAPLAZA, IM

GONZALEZDIAZ, G

SANCHEZQUESADA, F

RODRIGUEZVIDAL, M

机构：

[1] Univ Complutense, Dep de, Electricidad y Electronica, Madrid,, Spain, Univ Complutense, Dep de Electricidad y Electronica, Madrid, Spain

来源：

THIN SOLID FILMS | 1984年 / 120卷 / 01期

关键词：

FILMS - Optical Properties - MICROSCOPIC EXAMINATION - SPUTTERING;

D O I：

10.1016/0040-6090(84)90170-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

R. f. -sputtered CdS thin films have been produced from an intrinsic CdS target and their structural and optical properties have been studied to determine the influence of the sputtering conditions on these properties. Scanning electron microscopy showed that the grain size of the polycrystalline structures varied between 500 and 3000-4000 A, controlled by the target voltage (500-1600 V) or the substrate temperature (60-300 degree C). Optical measurements showed that the absorption edge was shifted towards higher wavelengths when the substrate bias voltage increased or when the gas pressure decreased; band gap values obtained ranged between 2. 23 and 2. 38 ev.

引用

页码：31 / 36

页数：6

共 9 条

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