THERMAL AND PLASMA-WAVE DEPTH PROFILING IN SILICON

被引：116

作者：

OPSAL, J

ROSENCWAIG, A

机构：

来源：

APPLIED PHYSICS LETTERS | 1985年 / 47卷 / 05期

关键词：

D O I：

10.1063/1.96105

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：498 / 500

页数：3

共 14 条

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[7] THERMAL-WAVE DEPTH PROFILING - THEORY [J].

OPSAL, J ;

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[9] DETECTION OF THERMAL WAVES THROUGH OPTICAL REFLECTANCE [J].

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[10]

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