THE SPUTTER DEPOSITION PROCESS - A MONTE-CARLO STUDY

被引：17

作者：

HEBERLEIN, T

KRAUTHEIM, G

WUTTKE, W

机构：

[1] Technische Hochschule Zwickau, Sektion MNI

来源：

VACUUM | 1991年 / 42卷 / 1-2期

关键词：

D O I：

10.1016/0042-207X(91)90076-U

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Monte-Carlo simulation offers a possibility to study the influence of different physical processes in sputter deposition. Taking into account target material, geometry, energy and angle of emission of the sputtered particles, gas scattering as well as particle losses, the film thickness, angular and energy distributions are calculated for different sputter conditions. The validity of the calculations is verified by comparison with experimental investigations. © 1990.

引用

页码：47 / 51

页数：5

共 4 条

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MOTOHIRO, T ;

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[3] ANGULAR-DISTRIBUTION OF SI ATOMS SPUTTERED BY KEV AR+ IONS [J].

OKUTANI, T ;

SHIKATA, M ;

ICHIMURA, S ;

SHIMIZU, R .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) :2884-2887

[4] ENERGY SPECTRUM OF EJECTED ATOMS DURING HIGH ENERGY SPUTTERING OF GOLD [J].

THOMPSON, MW .

PHILOSOPHICAL MAGAZINE, 1968, 18 (152) :377-&

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