APPLICATIONS OF MONTE-CARLO SIMULATION IN THE ANALYSIS OF A SPUTTER-DEPOSITION PROCESS

被引:101
作者
MOTOHIRO, T
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 02期
关键词
D O I
10.1116/1.573469
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:189 / 195
页数:7
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