PROCESS AND DEVICE PERFORMANCE OF SUBMICROMETER-CHANNEL CMOS DEVICES USING DEEP-TRENCH ISOLATION AND SELF-ALIGNED TISI2 TECHNOLOGIES

被引:13
作者
YAMAGUCHI, T
MORIMOTO, S
PARK, HK
EIDEN, GC
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关键词
D O I
10.1109/T-ED.1985.21928
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:184 / 193
页数:10
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