ON PROXIMITY EXPOSURE COMPENSATION IN ELECTRON-BEAM LITHOGRAPHY

被引:6
作者
DESHMUKH, PR
KHOKLE, WS
机构
关键词
D O I
10.1109/16.34285
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:2011 / 2017
页数:7
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