IMPROVED DELINEATION TECHNIQUE FOR 2-DIMENSIONAL DOPANT PROFILING

被引：12

作者：

GONG, L ^{[1
]}

PETERSEN, S ^{[1
]}

FREY, L ^{[1
]}

RYSSEL, H ^{[1
]}

机构：

[1] BEREICH BAUELEMENTETECHNOL,FRAUNHOFER INST INTEGRIERTE SCHALTUNGEN,D-91058 ERLANGEN,GERMANY

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 96卷 / 1-2期

关键词：

D O I：

10.1016/0168-583X(94)00472-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A chemical delineation technique suitable for two dimensional dopant profiling has been investigated and improved. The formation of equi-concentration lines in p-doped areas during chemical etching due to drastic changes of the etching rate as function of dopant concentration has been studied. Formation of p-n junction, degeneration of the semiconductor, and formation of recombination centers are discussed as possible cause of these changes. In addition, a new etching procedure for delineation of equi-concentration lines in n-doped regions was successfully tested.

引用

页码：133 / 138

页数：6

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