THE MECHANISM OF GAAS ETCHING IN CRO3-HF SOLUTIONS .1. EXPERIMENTAL RESULTS

被引：24

作者：

VANDEVEN, J ^{[1
]}

VANDENMEERAKKER, JEAM ^{[1
]}

KELLY, JJ ^{[1
]}

机构：

[1] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 12期

关键词：

D O I：

10.1149/1.2113715

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：3020 / 3026

页数：7

共 21 条

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