PROBING REACTIVE DEPOSITION AND SURFACE DYNAMICS USING IN-SITU REAL-TIME EMISSION MICROSCOPY

被引：7

作者：

KORDESCH, ME ^{[1
]}

机构：

[1] OHIO UNIV,CONDENSED MATTER & SURFACE SCI PROGRAM,ATHENS,OH 45701

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.579718

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1517 / 1521

页数：5

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