SURFACE REACTION-DIFFUSION FRONTS OBSERVED WITH PHOTOELECTRON EMISSION MICROSCOPY DURING CARBON DEPOSITION ON MO(310)

被引：5

作者：

GARCIA, A

KORDESCH, ME

机构：

[1] OHIO UNIV,CONDENSED MATTER & SURFACE SCI PROGRAM,ATHENS,OH 45701

[2] UNIV AUTONOMA SAN LUIS POTOSI,IICO,SAN LUIS POTOSI 78000,MEXICO

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.579570

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In situ, real-time photoelectron emission microscopy and post-deposition scanning Auger microscopy of carbon deposition on oxygen-covered Mo(310) at 950 K show that sulfur stabilizes the carbon layer on the Mo surface. Reaction diffusion fronts are observed to travel across the Mo surface. The leading edges of these fronts are divided into discrete bands. A model for the development of the bands based on the diffusion of carbon and sulfur and possibly other reactants is presented. © 1995 American Vacuum Society. © 1995, American Vacuum Society. All rights reserved.

引用

页码：1396 / 1399

页数：4

共 24 条

[1]

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