TIME-DEPENDENT HEAT-FLOW CALCULATION OF CW LASER-INDUCED MELTING OF SILICON

被引：28

作者：

SCHVAN, P

THOMAS, RE

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 10期

关键词：

D O I：

10.1063/1.335337

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4738 / 4741

页数：4

共 19 条

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[8] A GENERAL ANALYTIC TECHNIQUE FOR NON-LINEAR DYNAMIC TRANSPORT PROCESSES DURING LASER ANNEALING [J].

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