RESISTIVITY, OXIDATION-KINETICS AND DIFFUSION BARRIER PROPERTIES OF THIN-FILM ZRB2

被引：45

作者：

SHAPPIRIO, JR

FINNEGAN, JJ

LUX, RA

FOX, DC

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(84)90154-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：23 / 30

页数：8

共 9 条

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[4] DIFFUSION BARRIERS IN THIN-FILMS
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[5] POATE JM, 1978, THIN FILMS INTERDIFF, P362
[6] SYNTHESIS AND PROPERTIES OF SOME REFRACTORY TRANSITION-METAL DIBORIDE THIN-FILMS
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[7] SYNTHESIS AND PROPERTIES OF MELTED BORIDES OF TRANSITION-METALS
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[9] VLSI METALLIZATION - SOME PROBLEMS AND TRENDS
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