THE SELECTIVE REMOVAL OF THE NEGATIVE HIGH-RESOLUTION PHOTORESIST SYSTEM AG-AS-S

被引：10

作者：

BELFORD, RE ^{[1
]}

HAJTO, E ^{[1
]}

OWEN, AE ^{[1
]}

机构：

[1] UNIV EDINBURGH,DEPT ELECT ENGN,EDINBURGH EH9 3JL,MIDLOTHIAN,SCOTLAND

来源：

THIN SOLID FILMS | 1989年 / 173卷 / 01期

关键词：

D O I：

10.1016/0040-6090(89)90544-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：129 / 137

页数：9

共 19 条

[1] DRY-ETCHED INORGANIC RESIST [J].

CHANG, MS ;

CHEN, JT .

APPLIED PHYSICS LETTERS, 1978, 33 (10) :892-895

[2] SPIN COATED AMORPHOUS-CHALCOGENIDE FILMS - THERMAL-PROPERTIES [J].

CHERN, GC ;

LAUKS, I ;

MCGHIE, AR .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4596-4601

[3] SPIN COATED AMORPHOUS-CHALCOGENIDE FILMS - STRUCTURAL CHARACTERIZATION [J].

CHERN, GC ;

LAUKS, I .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) :2701-2705

[4] OPTICAL MONITORING OF PHOTODISSOLUTION KINETICS IN AMORPHOUS AS-S FILMS [J].

EWEN, PJS ;

ZAKERY, A ;

FIRTH, AP ;

OWEN, AE .

PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1988, 57 (01) :1-12

[5]

FIRTH AP, 1985, P SOC PHOTO-OPT INST, V539, P160, DOI 10.1117/12.947829

[6] THE GERMANIUM SELENIDE POLYMER BILEVEL PHOTORESIST SYSTEM - A REVIEW [J].

HUGGETT, PG ;

LEHMANN, HW .

JOURNAL OF ELECTRONIC MATERIALS, 1985, 14 (03) :205-230

[7]

INOUE E, 1974, J JAPAN SOC APPL P S, V43, P101

[8] PHOTO-LITHOGRAPHIC PROCESSES IN AMORPHOUS-SEMICONDUCTORS [J].

JANAI, M .

JOURNAL DE PHYSIQUE, 1981, 42 (NC4) :1105-1114

[9] DISCUSSION ON MECHANISM OF PHOTODOPING [J].

KOKADO, H ;

SHIMIZU, I ;

INOUE, E .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1976, 20 (01) :131-139

[10]

LAUKS I, 1982, ELECTROCHEM SOC P, V82, P93

← 1 2 →