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THE GERMANIUM SELENIDE POLYMER BILEVEL PHOTORESIST SYSTEM - A REVIEW

被引：4
作者：
HUGGETT, PG [1 ]
LEHMANN, HW [1 ]
机构：
[1] LABS RCA LTD,CH-8048 ZURICH,SWITZERLAND
来源：
JOURNAL OF ELECTRONIC MATERIALS | 1985年 / 14卷 / 03期
关键词：
D O I：
10.1007/BF02661219
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：205 / 230
页数：26
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