PREPARATION OF SI3N4 COATINGS BY ION PLATING

[1] CAPUTO R, 1973, JPL900629 JET PROP L, P85

[2] PREPARATION AND PROPERTIES OF AMORPHOUS SILICON NITRIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (07) : 717 - &

[3] ELSNER NB, 1974, IECEC P AM SOC MECHN, P152

[4] PYROLYTIC SI3N4 [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1972, 55 (08) : 431 - &

[5] ION IMPLANTATION IN SEMICONDUCTORS .I. RANGE DISTRIBUTION THEORY AND EXPERIMENTS [J]. PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1968, 56 (03): : 295 - +

[6] RECOIL TECHNIQUES IN NUCLEAR REACTION AND FISSION STUDIES [J]. ANNUAL REVIEW OF NUCLEAR SCIENCE, 1960, 10 : 235 - 258

[7] RF SPUTTERING [J]. THIN SOLID FILMS, 1970, 5 (04) : 209 - &

[8] KAMUSKY R, 1966, 26TH ANN PHYS EL C, P316

[9] KOCH J, 1965, NUCL INSTRUM METHODS, V38

[10] LAEGREID N, 1960, 6TH NAT S VAC TECHN, P164

[1] CAPUTO R, 1973, JPL900629 JET PROP L, P85

[2] PREPARATION AND PROPERTIES OF AMORPHOUS SILICON NITRIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (07) : 717 - &

[3] ELSNER NB, 1974, IECEC P AM SOC MECHN, P152

[4] PYROLYTIC SI3N4 [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1972, 55 (08) : 431 - &

[5] ION IMPLANTATION IN SEMICONDUCTORS .I. RANGE DISTRIBUTION THEORY AND EXPERIMENTS [J]. PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1968, 56 (03): : 295 - +

[6] RECOIL TECHNIQUES IN NUCLEAR REACTION AND FISSION STUDIES [J]. ANNUAL REVIEW OF NUCLEAR SCIENCE, 1960, 10 : 235 - 258

[7] RF SPUTTERING [J]. THIN SOLID FILMS, 1970, 5 (04) : 209 - &

[8] KAMUSKY R, 1966, 26TH ANN PHYS EL C, P316

[9] KOCH J, 1965, NUCL INSTRUM METHODS, V38

[10] LAEGREID N, 1960, 6TH NAT S VAC TECHN, P164