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INTERNAL-STRESS OF VAPOR-DEPOSITED ALUMINUM FILMS - EFFECT OF O-2 AND WATER-VAPOR PRESENT DURING FILM DEPOSITION

被引：39
作者：
ABERMANN, R
机构：
[1] Institute of Physical Chemistry, University of Innsbruck, A-6020 Innsbruck
来源：
THIN SOLID FILMS | 1990年 / 186卷 / 02期
关键词：
D O I：
10.1016/0040-6090(90)90145-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Thin films of aluminium were prepared under ultrahigh vacuum conditions in order to investigate the influence of water vapour and oxygen partial pressure on the internal film stress which was measured in situ during the deposition process with a cantilever beam apparatus. The general trends of the effect of varying water and oxygen pressure on the stress vs. thickness curve of aluminium films are similar in both cases. In the low pressure range, however, the size of the effect of oxygen is significantly larger than that of water. Gas uptake models previously suggested for the water-aluminium and oxygen-aluminium interaction are used to explain qualitatively the changes in the stress vs. thickness curves with varying gas pressure. © 1990.
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页码：233 / 240
页数：8
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