A ROTATING-RING-DISK STUDY OF THE PHOTODISSOLUTION OF N-SI IN AMMONIUM FLUORIDE SOLUTIONS

被引：32

作者：

STUMPER, J ^{[1
]}

PETER, LM ^{[1
]}

机构：

[1] UNIV SOUTHAMPTON,DEPT CHEM,SOUTHAMPTON SO9 5NH,HANTS,ENGLAND

来源：

JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1991年 / 309卷 / 1-2期

关键词：

D O I：

10.1016/0022-0728(91)87024-X

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

[No abstract available]

引用

页码：325 / 331

页数：7

共 8 条

[1] ANODIC-DISSOLUTION OF P-TYPE AND N-TYPE SILICON - KINETIC-STUDY OF THE CHEMICAL MECHANISM
EDDOWES, MJ
[J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1990, 280 (02): : 297 - 311
[2] THE ELECTROCHEMICAL-BEHAVIOR OF N-TYPE SILICON (111)-SURFACES IN FLUORIDE CONTAINING AQUEOUS-ELECTROLYTES
GERISCHER, H
LUBKE, M
[J]. BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1987, 91 (04): : 394 - 398
[3] DECONVOLUTION OF CHARGE INJECTION STEPS IN QUANTUM YIELD MULTIPLICATION ON SILICON
LEWERENZ, HJ
STUMPER, J
PETER, LM
[J]. PHYSICAL REVIEW LETTERS, 1988, 61 (17) : 1989 - 1992
[4] ANODIC PROPERTIES OF N-SI AND N-GE ELECTRODES IN HF SOLUTION UNDER ILLUMINATION AND IN THE DARK
MATSUMURA, M
MORRISON, SR
[J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1983, 147 (1-2) : 157 - 166
[5] ANODIC DISSOLUTION OF SILICON IN HYDROFLUORIC ACID SOLUTIONS
MEMMING, R
SCHWANDT, G
[J]. SURFACE SCIENCE, 1966, 4 (02) : 109 - &
[6] PHOTOCURRENT MULTIPLICATION DURING PHOTODISSOLUTION OF NORMAL-SI IN NH4F - DECONVOLUTION OF ELECTRON INJECTION STEPS BY INTENSITY MODULATED PHOTOCURRENT SPECTROSCOPY
PETER, LM
BORAZIO, AM
LEWERENZ, HJ
STUMPER, J
[J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1990, 290 (1-2): : 229 - 248
[7] INSITU CHARACTERIZATION OF THE ILLUMINATED SILICON-ELECTROLYTE INTERFACE BY FOURIER-TRANSFORM INFRARED-SPECTROSCOPY
PETER, LM
BLACKWOOD, DJ
PONS, S
[J]. PHYSICAL REVIEW LETTERS, 1989, 62 (03) : 308 - 311
[8] PHOTOCORROSION OF N-SI IN AMMONIUM FLUORIDE SOLUTIONS - AN INVESTIGATION BY INSITU FOURIER-TRANSFORM INFRARED-SPECTROSCOPY
PETER, LM
BLACKWOOD, DJ
PONS, S
[J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1990, 294 (1-2): : 111 - 121

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